Photo Mask Cleaner MODEL: AW-300

Brand: Technovision Inc
Product Code: Model TW-300
Availability: Out Of Stock
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Photomask Cleaning System

Cleaned photomasks are essential for improved product yield. Technovision's expertise in cleaning and drying techniques helps you maintain high standards of cleanness for any procedure involving photomasks.

The Photomask Cleaning System is available in four models that can be used with a wide range of small to large photomasks.

Features
  
Features
1
Allows fast scrub cleaning, rinsing, and drying of photomasks, all with a single system.
2
2 Provides even, precise cleaning with special brushes that leave no scratches on mask patterns.
3
Vertically places and transports photomasks to minimize stress during transport.
4
Most suited to cleaning of substrates for low-volume production of various devices and R&D.
5
Equipped with dedicated work holders for individual sizes and free-size work holders. Parts that come in contact with workpieces are made of plastic.
Standard device holder Free-size fits-all device holder Customized device holder

Standard device holder

Free-size fits-all device holder

Customized device holder

Uses

Photomasks:

Semiconductors, LCDs, OELDs, CFs, Thin Film Devices, IC Packaging, PWBs, PCBs, FPCs, etc., For use in cleaning plate-like substrates.

■Options

Surfactant injection unit, HEPA/ULPA unit, ionizer, hot air knife, and DI water heating unit Upright Compact Model

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